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Christopher Williams: The Production Line of Happiness

January 24 – May 18, 2014

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Presented by Art Institute of Chicago

Presented by Art Institute of Chicago

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Christopher Williams

Kodak Three Point Reflection Guide © 1968, Eastman Kodak Company, 1968 (Meiko laughing) Vancouver, B.C. April 6, 2005, 2005

Art Institute of Chicago

Christopher Williams

Punta Hicacos, Varadero, Cuba February 14, 2000, 2000

Art Institute of Chicago

Christopher Williams

Bergische Bauernscheune, Junkersholz Leichlingen, September 29, 2009, 2009

Art Institute of Chicago

Christopher Williams

Weimar Lux CDS, VEB Feingerätewerk Weimar Price 86,50 Mark GDR Filmempfindlichkeitsbereich 9 bis 45 DIN und 6 bis 25000 ASA Blendenskala 0,5 bis 45, Zeitskala 1/4000 Sekunde bis 8 Stunden, ca. 1980 Models: Ellena Borho and Christoph Boland November 12, 2010, 2010

Art Institute of Chicago

Christopher Williams

Bouquet for Bas Jan Ader and Christopher D’Arcangelo, 1991

Art Institute of Chicago

Christopher Williams

Erratum AGFA Color (oversaturated)..., 2000

Art Institute of Chicago

Christopher Williams

Fachhochschule Aachen Fachbereich Gestaltung Studiengang: Visuelle Kommunikation Fotolabor für Studenten Boxgraben 100, Aachen, November 8, 2010, 2010

Art Institute of Chicago

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Christopher Williams

Kodak Three Point Reflection Guide © 1968, Eastman Kodak Company, 1968 (Meiko laughing) Vancouver, B.C. April 6, 2005, 2005

Art Institute of Chicago

Christopher Williams

Punta Hicacos, Varadero, Cuba February 14, 2000, 2000

Art Institute of Chicago

Christopher Williams

Bergische Bauernscheune, Junkersholz Leichlingen, September 29, 2009, 2009

Art Institute of Chicago

Christopher Williams

Weimar Lux CDS, VEB Feingerätewerk Weimar Price 86,50 Mark GDR Filmempfindlichkeitsbereich 9 bis 45 DIN und 6 bis 25000 ASA Blendenskala 0,5 bis 45, Zeitskala 1/4000 Sekunde bis 8 Stunden, ca. 1980 Models: Ellena Borho and Christoph Boland November 12, 2010, 2010

Art Institute of Chicago

Christopher Williams

Bouquet for Bas Jan Ader and Christopher D’Arcangelo, 1991

Art Institute of Chicago

Christopher Williams

Erratum AGFA Color (oversaturated)..., 2000

Art Institute of Chicago

Christopher Williams

Fachhochschule Aachen Fachbereich Gestaltung Studiengang: Visuelle Kommunikation Fotolabor für Studenten Boxgraben 100, Aachen, November 8, 2010, 2010

Art Institute of Chicago

Christopher Williams

Kodak Three Point Reflection Guide © 1968, Eastman Kodak Company, 1968 (Meiko laughing) Vancouver, B.C. April 6, 2005, 2005

Art Institute of Chicago

Christopher Williams

Bergische Bauernscheune, Junkersholz Leichlingen, September 29, 2009, 2009

Art Institute of Chicago

Christopher Williams

Bouquet for Bas Jan Ader and Christopher D’Arcangelo, 1991

Art Institute of Chicago

Christopher Williams

Punta Hicacos, Varadero, Cuba February 14, 2000, 2000

Art Institute of Chicago

Christopher Williams

Weimar Lux CDS, VEB Feingerätewerk Weimar Price 86,50 Mark GDR Filmempfindlichkeitsbereich 9 bis 45 DIN und 6 bis 25000 ASA Blendenskala 0,5 bis 45, Zeitskala 1/4000 Sekunde bis 8 Stunden, ca. 1980 Models: Ellena Borho and Christoph Boland November 12, 2010, 2010

Art Institute of Chicago

Christopher Williams

Erratum AGFA Color (oversaturated)..., 2000

Art Institute of Chicago

Christopher Williams

Fachhochschule Aachen Fachbereich Gestaltung Studiengang: Visuelle Kommunikation Fotolabor für Studenten Boxgraben 100, Aachen, November 8, 2010, 2010

Art Institute of Chicago

Presented by Art Institute of Chicago

Art Institute of Chicago

Art Institute of Chicago

Art Institute of Chicago

Art Institute of Chicago